The plasma etching machine is one of the core devices in semiconductor processes. In semiconductor manufacturing, it uses plasma energy to finely process silicon wafers, which is a key step in the production of microelectronic devices. Plasma etching machines have high precision and can create extremely complex patterns at the microscopic level. The application of plasma etching machines in the semiconductor industry is very extensive. They can be used not only for etching semiconductor materials such as silicon and phosphorus but also for manufacturing chips and circuits. In addition, plasma etching machines play an important role in fields such as microelectronics, micro-electromechanical systems (MEMS), and nanotechnology applications.