ICP CVD Inductively coupled plasma chemical vapor deposition equipment (single cavity)
PL-200(ICP CVD) inductively coupled plasma chemical vapor deposition equipment has a wide range of applications in the semiconductor industry, such as the preparation of silicon nitride (SiN), silicon oxide (SiO2) and other dielectric films, these films play an important role in semiconductor devices, as an insulating layer, passivation layer or protective layer. It can also be used to prepare semiconductor materials such as amorphous silicon (a-Si) for solar cells, thin film transistors and other fields. Icp-cvd technology can be used to prepare composite materials with excellent properties, such as fibrous or whisker sediments, which can be used as the reinforcement phase of composite materials to improve the mechanical properties and thermal stability of composite materials.