The IBE-75 ion beam etching machine plays a key role in various high-tech and industrial fields, such as semiconductor manufacturing, microelectronics and optoelectronics, MEMS (Micro Electro Mechanical Systems), biomedicine, nanomaterial preparation, data storage and magnetic recording, and aerospace, due to its high precision and high controllability. It uses high-energy ion beams to bombard the surface of materials, causing atomic sputtering and achieving the purpose of etching. This etching technique can produce extremely fine device structures, improve the performance and stability of chips, and also create nanoscale structures on the surfaces of various materials, such as nanowires, nanopores, etc. This is of great significance for fields such as nanoelectronics and biomedical research. In addition, ion beam etching machines can also be used for the manufacturing of optical devices, to perform micro treatments on the surface of optical devices, improve surface quality, manufacture fine structures, and thereby enhance the performance and efficiency of optical devices.