The IBSD-100 dual ion beam sputtering assisted deposition coating is developed on the basis of single ion beam sputtering technology, adding an auxiliary ion source on top of the main sputtering source. It can be used for sputtering deposition of single-layer and multi-layer thin films of various metals, alloys, III-V compounds, and semiconductor materials. It can also synthesize thin films of oxides, nitrides, carbides, etc. from elemental materials through reactions.