PL-200(RIE)Reactive ion etching machine is one of the core equipment in semiconductor technology. In the semiconductor manufacturing process, it uses plasma energy to fine process silicon wafers, which is a key step in the manufacture of microelectronic devices. Plasma etchers have a high degree of precision and can create extremely complex patterns at the microscopic level. Plasma etchers are widely used in the semiconductor industry. It can be used not only to etch semiconductor materials, such as silicon and phosphorus, but also to make chips and circuits. In addition, reactive ion etchers also play an important role in the fields of microelectronics, micro-electro-mechanical systems (MEMS) and nanotechnology application manufacturing.