PL-200(PECVD) is a thin film deposition technology commonly used in the semiconductor industry to produce high-quality thin film layers, such as dielectric layers, low dielectric materials, etc., which are critical to improving the performance and reliability of semiconductor devices. In the production of optoelectronic devices, PECVD technology is used to deposit high-quality dielectric films and optical films to manufacture lasers, optical modulators, fiber optic sensors and other devices. PECVD is also used in the production of silicon-based optoelectronic devices, which have important applications in optical communication and integrated optics. PECVD plays an important role in the fields of semiconductor, new energy, biomedicine, electronics and materials science, etc. With the continuous progress of technology and the continuous expansion of application fields, this technology will play an important role in more fields and promote the development of related industries